BLUEPRINT 2017 – epluche

Paris based designer Laurie Brochard of Epluche will be at the Blueprint show 2 in New York from May 21st 23rd. Laurie has been working in the world of fashion, design and graphics for over ten years and is influenced by designers such as Orla kiely and Donna Wilson. Her designs are cute and whimsical yet sophisticated with a dash of Parisian style.

from print & pattern

Looking for pattern for your printing projects? Come and see this now

from Blogger


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